Item Name: high purity forged industrial titanium sputtering target 4N5
Purity: 99.99%~99.999%
Shape: Square/Round, According to your request
Size: Round: dia 25~300mm,Thickness:3~10mm; Rectangular: Length up to 1500mm
Customization is available
Item Name high purity forged industrial titanium target 99.999%
Purity 99.99%~99.999%
Shape Square/Round, According to your request
  Round: dia 25~300mm,Thickness:3~10mm
Size Rectangular: Length up to 1500mm
  Customization is available
Certificates ISO9001:2008, SGS, The third test report
Technics Vacuum Melting, Patented thermo-mechanical process
  Widely used in coating processing industries
  A: Solar Photovoltaic Application.
Application B: Electronic and Semiconductor Application.
  C: Decoration and Coating Application. etc.
Used Coating
The following table is a component analysis certificate for  4N5 Ti sputtering target. The analytical methods used are:
1. Analysis of metal elements using GDMS or ICP-OES;
2. Gas element analysis using LECO.
Elements Actual Spec Units Elements Actual Spec Units Elements Actual Spec Units
Li ˂0.005   ppm Zn ˂0.02   ppm Pb ˂0.01   ppm
B ˂0.01   ppm Ga ˂0.05   ppm Bi ˂0.01   ppm
F ˂0.05   ppm Ge ˂0.05   ppm Y     ppm
Na ˂0.01   ppm As ˂0.05   ppm Th ˂0.0001   ppm
Mg ˂0.01   ppm Se ˂0.05   ppm Er ˂0.005   ppm
Al 0.78   ppm Zr 0.08   ppm Ru ˂0.01   ppm
Si 0.15   ppm Nb ˂0.2   ppm Rh ˂0.05   ppm
P 0.03   ppm Mo ˂0.005   ppm Os ˂0.01   ppm
CI ˂0.01   ppm Pd ˂0.01   ppm Cs ˂0.01   ppm
K ˂0.01   ppm Ag ˂0.02   ppm Cd ˂0.05   ppm
Ca ˂0.5   ppm Sn 0.61   ppm  
Ti Matnx   wt% Sb ˂0.05   ppm
V 0.62   ppm Ba ˂0.005   ppm
Cr 5.4   ppm Hf ˂0.01   ppm
Mn 0.93   ppm Ta Source   ppm C ˂10   ppm
Fe 5.67   ppm W ˂0.05   ppm S 8.52   ppm
Co ˂0.01   ppm Pt ˂0.05   ppm O 250   ppm
Ni 0.06   ppm Au ˂0.05   ppm N 6.4   ppm
Cu 1.73   ppm Hg ˂0.1   ppm H ˂1   ppm

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