Hafnium target material series

Products attributes of Hf target 

Item Name

High Purity Hf target 99.95%


99.95% ,99.99%


Square /round, according to your request

Available size

Round: dia 25~250mm

Rectangular: length up to 1500mm

Customization is available

Impurity content

lower than 100ppm


ISO9001:2008, SGS, the third test report


Vacuum melting


widely used in coating processing industries

a: architectural glass, car using glass, graphic display field.

b:electronic and semiconductor field.

c:decoration and mould field.  

d:optics coating materials  


High Hard texture

Low impurity content

Better heat dissipation

High Tensile strength 

Hafnium has high melting point and coexist with zirconium, used as cathode of X-ray tube. Hafnium tungsten or hafnium molybdenum alloy is used as electrodes of high-pressure discharge tube. Hafnium can be used as getter of many inflation systems. The hafnium getter can remove oxygen, nitrogen and other needless gases existing in the system. Hafnium is also used for nuclear reactor control rods.


Hafnium target Hf+Zr≥99.99%              
Element Fe Cr Mo Al Ti Mn Ni U
Max(ppm) 100 5 10 5 10 5 12 1
Element Cu Sn Sb W Pb Bi Mg P
Max(ppm) 5 5 5 5 5 5 5 5
Element Si S Nb B Cd Be Ca Li
Max(ppm) 10 5 5 5 1 5 5 5
Element Zn Na V K N C H O
Max(ppm) 5 5 5 5 50 50 20 100
Element Zr
Max(ppm) Zr≤0.2% or Zr≤0.3% or Zr≤0.5% 

Applications: optics, semiconductor, electronics and other coating areas

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